The Barrier's Heights and Its Inhomogeneities on Diamond Silicon Interfaces.

In this work, the electrical parameters of the polycrystalline diamonds' p-PCD/n-Si heterojunction were investigated using temperature-dependent current-voltage (I-V) characteristics. In the temperature range of 80-280 K, the ideality factor (n) and energy barrier height () were found to be strongly temperature dependent. The increases with temperature rise, while the n value decreases.

The Hydrogenation Impact on Electronic Properties of p-Diamond/n-Si Heterojunctions.

The undoped polycrystalline diamond films (PDFs) have been deposited on n-type silicon (Si) by Hot Filament Chemical Vapor Deposition (HF CVD) technique. The reaction gases are a mixture of methane and hydrogen. The obtained PDFs were characterized by scanning electron microscopy (SEM) and Raman spectroscopy which, in addition to the diamond phase, also confirms the presence of sp2 hybridized carbon bonds.

The Undoped Polycrystalline Diamond Film-Electrical Transport Properties.

The polycrystalline diamonds were synthesized on n-type single crystalline Si wafer by Hot Filament CVD method. The structural properties of the obtained diamond films were checked by X-ray diffraction and Raman spectroscopy. The conductivity of n-Si/p-diamond, sandwiched between two electrodes, was measured in the temperature range of 90-300 K in a closed cycle cryostat under vacuum.

Orientation Dependence of Cathodoluminescence and Photoluminescence Spectroscopy of Defects in Chemical-Vapor-Deposited Diamond Microcrystal.

Point defects, impurities, and defect-impurity complexes in diamond microcrystals were studied with the cathodoluminescence (CL) spectroscopy in the scanning electron microscope, photoluminescence (PL), and Raman spectroscopy (RS). Such defects can influence the directions that microcrystals are grown. Micro-diamonds were obtained by a hot-filament chemical vapor deposition (HF CVD) technique from the methane-hydrogen gas mixture.

The n-Si/p-CVD Diamond Heterojunction.

Due to the possible applications, materials with a wide energy gap are becoming objects of interest for researchers and engineers. In this context, the polycrystalline diamond layers grown by CVD methods on silicon substrates seem to be a promising material for engineering sensing devices. The proper tuning of the deposition parameters allows us to develop the diamond layers with varying crystallinity and defect structure, as was shown by SEM and Raman spectroscopy investigations.