Aero-TiO three-dimensional nanoarchitecture for photocatalytic degradation of tetracycline.

One of the biggest issues of wide bandgap semiconductor use in photocatalytic wastewater treatment is the reusability of the material and avoiding the contamination of water with the material itself. In this paper, we report on a novel TiO aeromaterial (aero-TiO) consisting of hollow microtetrapods with ZnTiO inclusions. Atomic layer deposition has been used to obtain particles of unique shape allowing them to interlock thereby protecting the photocatalyst from erosion and damage when incorporated in active filters.

Room Temperature Synthesis of Tellurium by Solution Atomic Layer Deposition.

This study demonstrates the deposition of tellurium (Te) on silicon/silicon nitride substrates using solution atomic layer deposition (sALD) at ambient temperature. The process employs tellurium tetrachloride (TeCl) and bis(triethylsilyl)-telluride ((TES)Te) as precursors, with toluene as the solvent. Growth parameters were optimized through systematic variation of the pulse and purge times.

Comparison of Levitation Properties between Bulk High-Temperature Superconductor Blocks and High-Temperature Superconductor Tape Stacks Prepared from Commercial Coated Conductors.

Bulk high-temperature superconductors (HTSs) such as BaCuO (BCO, = Y, Gd) are commonly used in rotationally symmetric superconducting magnetic bearings. However, such bulks have several disadvantages such as brittleness, limited availability and high costs due to the time-consuming and energy-intensive fabrication process. Alternatively, tape stacks of HTS-coated conductors might be used for these devices promising an improved bearing efficiency due to a simplification of manufacturing processes for the required shapes, higher mechanical strength, improved thermal performance, higher availability and therefore potentially reduced costs.

Interfacial Distortion of SbTe-SbSe Multilayers via Atomic Layer Deposition for Enhanced Thermoelectric Properties.

Atomic layer deposition (ALD) is an effective technique for depositing thin films with precise control of layer thickness and functional properties. In this work, SbTe-SbSe nanostructures were synthesized using thermal ALD. A decrease in the SbTe layer thickness led to the emergence of distinct peaks from the Laue rings, indicative of a highly textured film structure with optimized crystallinity.