Optimization of the dynamic wavefront control of a pulsed kilojoule/nanosecond-petawatt laser facility.

The wavefront aberrations in a large-scale, flash-lamp-pumped, high-energy, high-power glass laser system can degrade considerably the quality of the final focal spot, and limit severely the repetition rate. The various aberrations induced on the Laboratoire pour l'Utilisation des Lasers Intenses (LULI), laser facility (LULI2000) throughout the amplification are identified and analyzed in detail. Based on these analyses, an optimized procedure for dynamic wavefront control is then designed and implemented.

Repetition rate increase and diffraction-limited focal spots for a nonthermal-equilibrium 100-TW Nd:glass laser chain by use of adaptive optics.

Dynamic wave-front correction is applied before each shot on a 100-TW, 30-J/300-fs high-power laser facility by use of an adaptive-optics system. This system allows us to increase the repetition rate of high-energy lasers while maintaining excellent and constant beam focusability with a Strehl ratio of >0.75 despite the amplifiers' not being in thermal equilibrium.