Processing Strategies for High-Performance Schottky Contacts on n-Type Oxide Semiconductors: Insights from InO.

Preparation of rectifying Schottky contacts on n-type oxide semiconductors, such as indium oxide (InO), is often challenged by the presence of a distinct surface electron accumulation layer. We investigated the material properties and electrical transport characteristics of platinum contact/indium oxide heterojunctions to define routines for the preparation of high-performance Schottky diodes on n-type oxide semiconductors. Combining the evaluation of different Pt deposition methods, such as electron-beam evaporation and (reactive) sputtering in an (O and) Ar atmosphere, with oxygen plasma interface treatments, we identify key parameters to obtain Schottky-type contacts with high electronic barrier height and high rectification ratio.

Faceting control by the stoichiometry influence on the surface free energy of low-index bcc-In2O3 surfaces.

The faceting of In2O3(0 0 1), (0 1 1), and (1 1 1) grown by plasma-assisted molecular beam epitaxy on yttria-stabilised zirconia was investigated under different growth conditions-conventionally used oxygen-rich growth conditions with and without heavy Sn-doping, and indium-rich growth conditions-by in situ reflection high-energy electron diffraction, scanning electron microscopy, x-ray diffraction, and atomic force microscopy. In a simple thermodynamic model that considers surface free energy only, the observed faceting is compared to recent theoretical predictions of the surface tension (also termed surface free energy) anisotropy and the related equilibrium crystal shape derived from a Wulff construction. These predictions and our comparison include the variation with growth-condition-dependent oxygen chemical potential.