An Analytic Equation for Assessing the Thickness of Titanium Nitride Coatings by Energy Dispersive X-ray Spectroscopy in the Scanning Electron Microscope.

In this study, a methodology for assessing the thickness of titanium nitride (TiN) coatings by energy dispersive X-ray spectroscopy (EDS) in the scanning electron microscope is explored. A standardless method is applied, where the film thickness (th) is related to the microscope accelerating voltage (V0), the type of substrate and the ratio between the more intense peaks in the EDS spectrum, arising from both the substrate and the coating (afterwards called the I-ratio, IR). Three different substrates covered with TiN were studied, namely, silicon, glass, and stainless steel.

Accuracy of a reference-free Monte Carlo approach for SEM-EDS thickness assessment of TiN coatings onto diverse substrates.

Energy dispersive spectroscopy (EDS) experiments were carried out in the scanning electron microscope (SEM) on top of either stainless steel (SS), silicon or glass substrates covered with TiN nitride coatings. The nominal coating thicknesses were 0.43, 1.