Novel functionalization of Ti-V alloy and Ti-II using atomic layer deposition for improved surface wettability.

Surface wettability characteristics of commercially pure titanium (CP-Ti/Ti-II) and titanium Grade 5 alloy (Ti-6Al-4V/Ti-V) with 10nm-thick atomic layer deposited (ALD) TiO2 from Tetrakis DiEthyl Amino Titanium and water vapor were studied in conjunction with cleaning steps before and after the ALD treatment. The wettability characteristics of rough Ti-II and Ti-V samples were investigated after each step, that is, as received, after de-ionized (DI) water rinse followed by N2 drying, sonication in methanol, ALD treatment, and post-ALD DI water rinse. Samples without ALD or cleaning treatments were hydrophobic to variable extents, depending on exposure to different environments, surface impurities, roughness, and aging.