Towards fully integrated wireless impedimetric sensors.

We report on the design and characterization of the building blocks of a single-chip wireless chemical sensor fabricated with a commercial complementary metal-oxide-silicon (CMOS) technology, which includes two types of transducers for impedimetric measurements (4-electrode array and two interdigitated electrodes), instrumentation circuits, and a metal coil and circuits for inductive power and data transfer. The electrodes have been formed with a polycrystalline silicon layer of the technology by a simple post-process that does not require additional deposition or lithography steps, but just etching steps. A linear response to both conductivity and permittivity of solutions has been obtained.