Reactive ion-assisted deposition of e-beam evaporated titanium for high refractive index TiO2 layers and laser damage resistant, broad bandwidth, high-reflection coatings.

High-reflection coatings with broad bandwidth can be achieved by pairing a low refractive index material, such as SiO2, with a high refractive index material, such as TiO2. To achieve high refractive index, low absorption TiO2 films, we optimized the reactive, ion-assisted deposition process (O2 levels, deposition rate, and ion beam settings) using e-beam evaporated Ti. TiO2 high-index layers were then paired with SiO2 low-index layers in a quarter-wave-type coating to achieve a broader high-reflection bandwidth compared to the same coating composed of HfO2/SiO2 layer pairs.

Comparisons between laser damage and optical electric field behaviors for hafnia/silica antireflection coatings.

We compare designs and laser-induced damage thresholds (LIDTs) of hafnia/silica antireflection (AR) coatings for 1054 nm or dual 527 nm/1054 nm wavelengths and 0° to 45° angles of incidence (AOIs). For a 527 nm/1054 nm, 0° AOI AR coating, LIDTs from three runs arbitrarily selected over three years are ∼20 J/cm2 or higher at 1054 nm and <10 J/cm2 at 527 nm. Calculated optical electric field intensities within the coating show two intensity peaks for 527 nm but not for 1054 nm, correlating with the lower (higher) LIDTs at 527 nm (1054 nm).