Tuning Stoichiometry and Structure of Pd-WO Thin Films for Hydrogen Gas Sensing by High-Power Impulse Magnetron Sputtering.

By tuning the deposition parameters of reactive high-power impulse magnetron sputtering, specifically the pulse length, we were able to prepare WO films with various stoichiometry and structure. Subsequently, the films were annealed in air at moderate temperature (350 °C). We demonstrate that the stoichiometry of the as-deposited films influences considerably the type of crystalline phase formed in the annealed films.

High-performance thermochromic VO-based coatings with a low transition temperature deposited on glass by a scalable technique.

We report on high-performance thermochromic ZrO/VWO/ZrO coatings with a low transition temperature prepared on glass by a low-temperature scalable deposition technique. The VWO layers were deposited by a controlled high-power impulse magnetron sputtering of V target, combined with a simultaneous pulsed DC magnetron sputtering of W target to reduce the transition temperature to 20-21 °C, at a low substrate surface temperature of 330 °C in an argon-oxygen gas mixture. ZrO antireflection layers both below and above the thermochromic VWO layers were deposited at a low substrate temperature (< 100 °C).