Publications by authors named "Jin Joo Ryu"

Article Synopsis
  • - This study explores how changes in chemical composition of germanium telluride (GeTe) thin films affect their physical and electronic properties, particularly focusing on threshold switching (TS) behavior.
  • - Increasing tellurium (Te) content in these films impacts their crystallinity, bandgap, and electronic trap distribution, leading to key insights on maintaining optimal conditions for stable TS characteristics.
  • - The research highlights the importance of precise control over chemical composition to ensure reliable performance in TS applications, suggesting potential for material optimization in other related technologies.
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This study describes a modified atomic layer deposition (ALD) process for fabricating BiOSe thin films, targeting their application as high-k dielectrics in semiconductor devices, especially for two-dimensional semiconductors. Using an intermediate-enhanced ALD technique for BiSe and a plasma-enhanced ALD process for BiO, a method for the sequential deposition of BiSeO ternary films has been established. The thin film has been deposited on SiO and TiN substrates, exhibiting growth rates of 0.

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Memristor-integrated passive crossbar arrays (CAs) could potentially accelerate neural network (NN) computations, but studies on these devices are limited to software-based simulations owing to their poor reliability. Herein, we propose a self-rectifying memristor-based 1 kb CA as a hardware accelerator for NN computations. We conducted fully hardware-based single-layer NN classification tasks involving the Modified National Institute of Standards and Technology database using the developed passive CA, and achieved 100% classification accuracy for 1500 test sets.

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Conventional computing architectures are poor suited to the unique workload demands of deep learning, which has led to a surge in interest in memory-centric computing. Herein, a trilayer (HfSiO/AlO/HfSiO)-based self-rectifying resistive memory cell (SRMC) that exhibits (i) large selectivity (ca. 10), (ii) two-bit operation, (iii) low read power (4 and 0.

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Fully "Erase-free" multi-bit operation was demonstrated in a W/HfO/TiN-stacked resistive switching device. The term Erase-free means that a digital state in a multi-bit operation can be achieved without initializing the device resistance state when the device moves to another digital state. Because initializing the resistance state of a resistive switching device causes high energy consumption, omitting this sequence can achieve energy efficient multi-bit operation during rewriting of the resistance state of the device.

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