Pose error correction in offline three-dimensional profile measurement system for large-diameter aspheric mirror.

This paper proposes an offline measurement method for a large aspheric mirror during its grinding stage. A measurement method and mathematical model to realize a three-dimensional (3D) profile measurement for large-diameter aspheric mirrors are proposed, based on a cylindrical coordinate system. The measurement error induced by the alignment error is examined based on the error analysis of the measurement and workpiece coordinate systems.

Alignment Method for Linear-Scale Projection Lithography Based on CCD Image Analysis.

This paper presents a method to improve the alignment accuracy of a mask in linear scale projection lithography, in which the adjacent pixel gray square variance method is applied to a charge-coupled device (CCD) image to obtain the best position of the focal length of the motherboard and then realize the alignment of the focal plane. Two image positions in the focal plane of the CCD are compared with the traits overlap according to the image splicing principle, and four typical errors are corrected on the basis of the total grating errors. Simultaneously, the rotation error of the mask is used to summarize the grayscale variation function of the CCD image.

Multi-Repeated Projection Lithography for High-Precision Linear Scale Based on Average Homogenization Effect.

A multi-repeated photolithography method for manufacturing an incremental linear scale using projection lithography is presented. The method is based on the average homogenization effect that periodically superposes the light intensity of different locations of pitches in the mask to make a consistent energy distribution at a specific wavelength, from which the accuracy of a linear scale can be improved precisely using the average pitch with different step distances. The method's theoretical error is within 0.