Actively Tunable Metasurfaces via Plasmonic Nanogap Cavities with Sub-10-nm VO Films.

Actively tunable optical materials integrated with engineered subwavelength structures could enable novel optoelectronic devices, including reconfigurable light sources and tunable on-chip spectral filters. The phase-change material vanadium dioxide (VO) provides a promising solid-state solution for dynamic tuning; however, previous demonstrations have been limited to thicker and often rough VO films or require a lattice-matched substrate for growth. Here, sub-10-nm-thick VO films are realized by atomic layer deposition (ALD) and integrated with plasmonic nanogap cavities to demonstrate tunable, spectrally selective absorption across 1200 nm in the near-infrared (NIR).

Optical Limiting Based on Huygens' Metasurfaces.

Optical limiting is desirable or necessary in a variety of applications that employ high-power light sources or sensitive photodetectors. However, the most prevalent methods compromise between on-state transmission and turndown ratio or rely on narrow transmission windows. We demonstrate that a metasurface-based architecture incorporating phase-change materials enables both high and broadband on-state transmission (-4.

Atomic Layer Deposition of Ultrathin Nickel Sulfide Films and Preliminary Assessment of Their Performance as Hydrogen Evolution Catalysts.

Transition metal sulfides show great promise for applications ranging from catalysis to electrocatalysis to photovoltaics due to their high stability and conductivity. Nickel sulfide, particularly known for its ability to electrochemically reduce protons to hydrogen gas nearly as efficiently as expensive noble metals, can be challenging to produce with certain surface site compositions or morphologies, e.g.

Porphyrins as Templates for Site-Selective Atomic Layer Deposition: Vapor Metalation and in Situ Monitoring of Island Growth.

Examinations of enzymatic catalysts suggest one key to efficient catalytic activity is discrete size metallo clusters. Mimicking enzymatic cluster systems is synthetically challenging because conventional solution methods are prone to aggregation or require capping of the cluster, thereby limiting its catalytic activity. We introduce site-selective atomic layer deposition (ALD) on porphyrins as an alternative approach to grow isolated metal oxide islands that are spatially separated.

Fabrication of Thin Films of α-Fe2O3 via Atomic Layer Deposition Using Iron Bisamidinate and Water under Mild Growth Conditions.

Atomic layer deposition (ALD) has been shown to be an excellent method for depositing thin films of iron oxide. With limited iron precursors available, the methods widely used require harsh conditions such as high temperatures and/or the use of oxidants such as ozone or peroxide. This letter aims to show that bis(N,N'-di-t-butylacetamidinato) iron(II) (iron bisamidinate or FeAMD) is an ideal ALD precursor because of its reactivity with water and relative volatility.

Real-time observation of atomic layer deposition inhibition: metal oxide growth on self-assembled alkanethiols.

Through in situ quartz crystal microbalance (QCM) monitoring, we resolve the growth of a self-assembled monolayer (SAM) and subsequent metal oxide deposition with high resolution. We introduce the fitting of mass deposited during each atomic layer deposition (ALD) cycle to an analytical island-growth model that enables quantification of growth inhibition, nucleation density, and the uninhibited ALD growth rate. A long-chain alkanethiol was self-assembled as a monolayer on gold-coated quartz crystals in order to investigate its effectiveness as a barrier to ALD.

Fabrication of transparent-conducting-oxide-coated inverse opals as mesostructured architectures for electrocatalysis applications: a case study with NiO.

Highly ordered, and conductive inverse opal arrays were made with silica and subsequently coated with tin-doped indium oxide (ITO) via atomic layer deposition (ALD). We demonstrate the utility of the resulting mesostructured electrodes by further coating them with nickel oxide via ALD. The NiO-coated arrays are capable of efficiently electrochemically evolving oxygen from water.

Systematic modulation of quantum (electron) tunneling behavior by atomic layer deposition on nanoparticulate SnO2 and TiO2 photoanodes.

Ultrathin films of TiO2, ZrO2, and Al2O3 were conformally created on SnO2 and TiO2 photoelectrodes via atomic layer deposition (ALD) to examine their influence upon electron transfer (ET) from the electrodes to a representative molecular receptor, I3(-). Films thicker than 2 Å engender an exponential decrease in ET time with increasing film thickness, consistent with tunneling theory. Increasing the height of the barrier, as measured by the energy difference between the transferring electron and the bottom of the conduction band of the barrier material, results in steeper exponential drops in tunneling rate or probability.