Production of mixed phase Ti-rich TiO thin films by oxide defect engineered crystallization.

Amorphous TiO has insufficient chemical stability that can be enhanced with annealing induced crystallization. However, the crystalline structure is already predetermined by the defect composition of the amorphous phase. In this paper, we demonstrate that the oxide defects, , oxygen vacancies and Ti states, can be created by O deficiency during ion-beam sputter deposition without affecting the O/Ti ratio of TiO.

Optical Performance Assessment of Nanostructured Alumina Multilayer Antireflective Coatings Used in III-V Multijunction Solar Cells.

The optical performance of a multilayer antireflective coating incorporating lithography-free nanostructured alumina is assessed. To this end, the performance of single-junction GaInP solar cells and four-junction GaInP/GaAs/GaInNAsSb/GaInNAsSb multijunction solar cells incorporating the nanostructured alumina is compared against the performance of similar solar cells using conventional double-layer antireflective coating. External quantum efficiency measurements for GaInP solar cells with the nanostructured coating demonstrate angle-independent operation, showing only a marginal difference at 60° incident angle.

Use of nanostructured alumina thin films in multilayer anti-reflective coatings.

A new method for modification of planar multilayer structures to create nanostructured aluminum oxide anti-reflection coatings is reported. The method is non-toxic and low-cost, being based on treatment of the coating with heated de-ionized water after the deposition of aluminum oxide. The results show that the method provides a viable alternative for attaining a low reflectance ARC.

High molecular weight block copolymer lithography for nanofabrication of hard mask and photonic nanostructures.

An unusual dot pattern was realized via self-assembly of high molecular weight polystyrene-block-polydimethylsiloxane (PS-b-PDMS) copolymer by a simple one-step solvent annealing process, optimized based on Hansen solubility parameters. Annealing PS-b-PDMS under neutral solvent vapors at room temperature produces an ordered arrangement of dots with ∼112 nm spacing and ∼54 nm diameter. The template is highly resistant to dry etching with chlorine-based plasma, enabling its utilization on a variety of hard masks and substrates.