Publications by authors named "Jaidah Mohan"

Article Synopsis
  • Aluminum nitride (AlN) thin films were successfully grown using thermal atomic layer deposition at temperatures between 175-350 °C, utilizing trimethyl aluminum (TMA) and hydrazine (NH) for better growth efficiency.
  • The use of hydrazine (NH) resulted in a growth per cycle (GPC) that was roughly 2.3 times higher than when ammonia (NH3) was used, while also reducing impurity levels in the films.
  • At 225 °C, the AlN films achieved a nearly ideal Al to N ratio of 1:1.1 and low oxygen content (7.5%), demonstrating the effectiveness of NH for enhanced film properties and performance.
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Hexagonal boron nitride (-BN) has been considered a promising dielectric for two-dimensional (2D) material-based electronics due to its atomically smooth and charge-free interface with an in-plane lattice constant similar to that of graphene. Here, we report atomic layer deposition of boron nitride (ALD-BN) using BCl and NH precursors directly on thermal SiO substrates at a relatively low temperature of 600 °C. The films were characterized by X-ray photoelectron spectroscopy, atomic force microscopy, and transmission electron microscopy wherein the uniform, atomically smooth, and nanocrystalline layered-BN thin film growth is observed.

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The discovery of ferroelectricity in HfO-based materials in 2011 provided new research directions and opportunities. In particular, for atomic layer deposited HfZrO (HZO) films, it is possible to obtain homogenous thin films with satisfactory ferroelectric properties at a low thermal budget process. Based on experiment demonstrations over the past 10 years, it is well known that HZO films show excellent ferroelectricity when sandwiched between TiN top and bottom electrodes.

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Increasing interest in the development of alternative energy storage technologies has led to efforts being taken to improve the energy density of dielectric capacitors with high power density. However, dielectric polymer materials still have low energy densities because of their low dielectric constant, whereas Pb-based materials are limited by environmental issues and regulations. Here, the energy storage behaviors of atomic layer-deposited HfZr O ( X = 0-1) thin films (10 nm) and the phase transformation mechanism associated with an enhancement of their energy density are reported using unipolar pulse measurements.

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