Large Area Nanohole Arrays for Sensing Fabricated by Interference Lithography.

Several fabrication techniques are recently used to produce a nanopattern for sensing, as focused ion beam milling (FIB), e-beam lithography (EBL), nanoimprinting, and soft lithography. Here, interference lithography is explored for the fabrication of large area nanohole arrays in metal films as an efficient, flexible, and scalable production method. The transmission spectra in air of the 1 cm substrate were evaluated to study the substrate behavior when hole-size, periodicity, and film thickness are varied, in order to elucidate the best sample for the most effective sensing performance.

Improving the performance of gold nanohole array biosensors by controlling the optical collimation conditions.

An experimental investigation on how the bulk and surface sensitivities of gold nanohole arrays fabricated by interference lithography affect the degree of white light beam collimation is presented. The optical transmission response of nanohole arrays has been recorded by focused and collimated beam transmission spectra. The results show that both the bulk and surface sensitivities for the collimated case are much larger than for the focused case.