Instantaneous growth of single monolayers as the origin of spontaneous core-shell InGaN nanowires with bright red photoluminescence.

Increasing the InN content in the InGaN compound is paramount for optoelectronic applications. It has been demonstrated in homogeneous nanowires or deliberately grown nanowire heterostructures. Here, we present spontaneous core-shell InGaN nanowires grown by molecular beam epitaxy on Si substrates at 625 °C.

Fast switching between the ground- and excited-state lasing in a quantum-dot microdisk triggered by sub-ps pulses.

A quantum-dot microdisk was optically pumped by continuous-wave excitation with a level sufficient for the ground-state lasing. The microdisk was additionally illuminated with sub-ps pulses of various powers. It was found that there is a critical level of pulse power that determines the subsequent transient process of the microlaser.

Two-state lasing in a quantum dot racetrack microlaser.

The peculiarities of two-state lasing in a racetrack microlaser with an InAs/GaAs quantum dot active region are investigated by measuring the electroluminescence spectra at various injection currents and temperatures. Unlike edge-emitting and microdisk lasers, where two-state lasing involves the ground and first excited-state optical transitions of quantum dots, in racetrack microlasers, we observe lasing through the ground and second excited states. As a result, the spectral separation between lasing bands is doubled to more than 150 nm.

Temperature Evolution of Two-State Lasing in Microdisk Lasers with InAs/InGaAs Quantum Dots.

One-state and two-state lasing is investigated experimentally and through numerical simulation as a function of temperature in microdisk lasers with Stranski-Krastanow InAs/InGaAs/GaAs quantum dots. Near room temperature, the temperature-induced increment of the ground-state threshold current density is relatively weak and can be described by a characteristic temperature of about 150 K. At elevated temperatures, a faster (super-exponential) increase in the threshold current density is observed.

Submicron-Size Emitters of the 1.2-1.55 μm Spectral Range Based on InP/InAsP/InP Nanostructures Integrated into Si Substrate.

We study photoluminescence of InP/InAsP/InP nanostructures monolithically integrated to a Si(100) substrate. The InP/InAsP/InP nanostructures were grown in pre-formed pits in the silicon substrate using an original approach based on selective area growth and driven by a molten alloy in metal-organic vapor epitaxy method. This approach provides the selective-area synthesis of the ordered emitters arrays on Si substrates.