Dehydrogenation mechanism of liquid organic hydrogen carriers: dodecahydro-N-ethylcarbazole on Pd(111).

Dodecahydro-N-ethylcarbazole (H12-NEC) has been proposed as a potential liquid organic hydrogen carrier (LOHC) for chemical energy storage, as it combines both favourable physicochemical and thermodynamic properties. The design of optimised dehydrogenation catalysts for LOHC technology requires a detailed understanding of the reaction pathways and the microkinetics. Here, we investigate the dehydrogenation mechanism of H12-NEC on Pd(111) by using a surface-science approach under ultrahigh vacuum conditions.

Dehydrogenation of dodecahydro-N-ethylcarbazole on Pd/Al2O3 model catalysts.

To elucidate the dehydrogenation mechanism of dodecahydro-N-ethylcarbazole (H(12)-NEC) on supported Pd catalysts, we have performed a model study under ultra high vacuum (UHV) conditions. H(12)-NEC and its final dehydrogenation product, N-ethylcarbazole (NEC), were deposited by physical vapor deposition (PVD) at temperatures between 120 K and 520 K onto a supported model catalyst, which consisted of Pd nanoparticles grown on a well-ordered alumina film on NiAl(110). Adsorption and thermally induced surface reactions were followed by infrared reflection absorption spectroscopy (IRAS) and high-resolution X-ray photoelectron spectroscopy (HR-XPS) in combination with density functional theory (DFT) calculations.

Toward ionic-liquid-based model catalysis: growth, orientation, conformation, and interaction mechanism of the [Tf2N]- anion in [BMIM][Tf2N] thin films on a well-ordered alumina surface.

Aiming at a better understanding of the interaction of ionic liquid (IL) thin films with oxide supports, we have performed a model study under ultrahigh vacuum (UHV) conditions. We apply infrared reflection absorption spectroscopy (IRAS) in combination with density functional theory (DFT). Thin films of 1-butyl-3-methylimidazolium bis(trifluoromethylsulfonyl)imide [BMIM][Tf(2)N] are grown on an atomically flat, well-ordered alumina film on NiAl(110) using a novel UHV-compatible evaporator.