The authors wish to make the following correction to this paper [1]. In Equation (8), logarithm (ln) term is missing[..
View Article and Find Full Text PDFP-type Mg doped CuCrO₂ thin films have been deposited on fused silica substrates by Radio-Frequency (RF) magnetron sputtering. The as-deposited CuCrO₂:Mg thin films have been annealed at different temperatures (from 450 to 650 °C) under primary vacuum to obtain the delafossite phase. The annealed samples exhibit 3R delafossite structure.
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