Interferometry based technique for intensity profile measurements of far IR beams.

We present a novel, to the best of our knowledge, method for measuring the intensity profile of far-IR beams. The method is based on the measurements of nonstationary variation in optical thickness of a fused-silica plate heated by the studied radiation. The optical thickness is observed by means of a reflecting interferometer.

High-precision methods and devices for in situ measurements of thermally induced aberrations in optical elements.

An optical system that comprises two devices for remote measurements, a broadband optical interferometer and a scanning Hartmann sensor, is described. The results of simultaneous measurements with both devices and the results of numerical modeling of sample surface heating are presented.