Si film electrodes were deposited onto Cu foil current collectors fabricated with well-formed CuO nanostructures. The structural and electrochemical properties of the Cu foils oxidized for 1, 3, and 6 h and of the Si film electrodes were investigated using field-emission scanning electron microscopy, X-ray diffraction (XRD), and charge/discharge tests. The morphologies and XRD profiles suggested that the oxidized Cu foils consisted of a top CuO layer and a bottom Cu2O layer.
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