Publications by authors named "Hyun-Jae Park"

Article Synopsis
  • Endovascular embolization is a minimally invasive method for treating blood vessel lesions, using liquid agents to block blood flow under X-ray guidance.
  • Histoacryl, a common liquid embolic agent, has limitations like poor X-ray visibility and strong adhesion to the delivery device, prompting the research into alternative agents.
  • The study developed and tested a new agent called 4-iodobutyl 2-cyanoacrylate (IBCA), which showed promising results in experiments with rabbits and swine, indicating its potential for clinical use.
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The objective of this study is to investigate the synthesis and influence of MoS on carbon nanowalls (CNWs) as supercapacitor electrodes. The synthesis of MoS on CNW was achieved by the introduction of hydrogen remote plasma from ammonium tetrathiomolybdate (ATTM) without deterioration of the CNWs. The topographical surface structures and electrochemical characteristics of the MoS-CNW composite electrodes were explored using two ATTM-dispersed organic solvents-acetonitrile and dimethylformamide (DMF).

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To validate the possibility of the developed microwave plasma source with a novel structure for plasma aerosol deposition, the characteristics of the plasma flow velocity generated from the microwave plasma source were investigated by a Mach probe with pressure variation. Simulation with the turbulent model was introduced to deduce calibration factor of the Mach probe and to compare experimental measurements for analyses of collisional plasma conditions. The results show calibration factor does not seem to be a constant parameter and highly dependent on the collision parameter.

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The novel technique of Plasma-Assisted Vapor Deposition (PAVD) is developed as a new deposition method for thin metal films. The PAVD technique yields a high-quality thin film without any heating of the substrate because evaporated particles acquire energy from plasma that is confined to the inside of the evaporation source. Experiments of silver thin film deposition have been carried out in conditions of pressure lower than 10 Pa.

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