Scanning Deposition Method for Large-Area Diamond Film Synthesis Using Multiple Microwave Plasma Sources.

The demand for synthetic diamonds and research on their use in next-generation semiconductor devices have recently increased. Microwave plasma chemical vapor deposition (MPCVD) is considered one of the most promising techniques for the mass production of large-sized and high-quality single-, micro- and nanocrystalline diamond films. Although the low-pressure resonant cavity MPCVD method can synthesize high-quality diamonds, improvements are needed in terms of the resulting area.

Compact water-cooled surface wave plasma source for remote plasma cleaning.

This paper describes the design and operation of a compact surface wave plasma source for remote plasma processing [i.e., plasma enhanced chemical vapor deposition chamber cleaning, dry etching (SiO, SiN, and silicon), photoresist stripping (SU-8), and decapsulation of microchips].

Honeycomblike large area LaB6 plasma source for Multi-Purpose Plasma facility.

A Multi-Purpose Plasma (MP(2)) facility has been renovated from Hanbit mirror device [Kwon et al., Nucl. Fusion 43, 686 (2003)] by adopting the same philosophy of diversified plasma simulator (DiPS) [Chung et al.