Thin film transparent oxides have attracted considerable attention over the last few decades for transparent electronic applications, such as flat panel displays, solar cells, touch-pads, and mobile devices. Metallic doped InZnO (IZO) films have been suggested for the transparent layer exhibiting semiconducting or metallic properties because of its controllable mobility and excellent electrical properties, but they show a degradation of the electrical performance under bending conditions. This study assessed Ni doped IZO (NIZO) films as a flexible transparent electrode on different flexible transparent substrates for flexible electronic applications.
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