Effects of reduced chemical vapor deposition environment on growth and optical characteristics of TiO2 nanobelts.

TiO2-delta nanobelts were self-catalytically grown at 510 degrees C on bare Si (100) substrates using metallorganic chemical vapor deposition. The nanobelt formation was critically affected by the partial pressure of oxygen. The nanobelts were grown when supplying only Ar or a mixed gas of Ar (90%) and H2 (10%), while thin films were formed with an O2 gas flow of more than 50 cm3 min(-1).