Publications by authors named "Hisanao Akima"

We considered a modular network with a binomial degree distribution and related the analytical relationships of the network properties (modularity, average clustering coefficient, and small-worldness) with structural parameters that define the network, i.e., number of nodes, number of modules, average node degree, and ratio of intra-modular to total connections.

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As in many naturally formed networks, the brain exhibits an inherent modular architecture that is the basis of its rich operability, robustness, and integration-segregation capacity. However, the mechanisms that allow spatially segregated neuronal assemblies to swiftly change from localized to global activity remain unclear. Here, we integrate microfabrication technology with in vitro cortical networks to investigate the dynamical repertoire and functional traits of four interconnected neuronal modules.

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The atomic-layer (AL) doping technique in epitaxy has attracted attention as a low-resistive ultrathin semiconductor film as well as a two-dimensional (2-D) carrier transport system. In this paper, we report carrier properties for B AL-doped Si films with suppressed thermal diffusion. B AL-doped Si films were formed on Si(100) by B AL formation followed by Si cap layer deposition in low-energy Ar plasma-enhanced chemical-vapor deposition without substrate heating.

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We study the effect of network size on synchronized activity in living neuronal networks. Dissociated cortical neurons form synaptic connections in culture and generate synchronized spontaneous activity within 10 days in vitro. Using micropatterned surfaces to extrinsically control the size of neuronal networks, we show that synchronized activity can emerge in a network as small as 12 cells.

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A method for measuring large aberrations up to second order (defocus, 2-fold astigmatism and axial coma), which uses a through-focus series of Ronchigrams, is proposed. The method is based on the principle that line-focus conditions in Ronchigrams can be locally detected and low-order aberrations can thereby be measured. The proposed method provides auto-tuning of large low-order aberration; in particular, iterative aberration measurement and correction reduce low-order aberrations from several thousand nanometers to less than a few hundred nanometers, which can be handled by conventional fine-aberration tuning methods.

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