Control of the microdomain orientation in block copolymer thin films with homopolymers for lithographic application.

Block copolymer lithography is a promising method for fabricating periodical nanopatterns of less than 20 nm by self-assembly and can be applicable for fabricating patterned magnetic media with a recording density over 1 Tb/in.2. We found a simple technique to control the orientation of cylindrical microdomains in thin films.