Pulsed Laser Ablation Characteristics of Light-Absorbing Mask Layer Based on Coating Thicknesses under Laser Lift-Off Patterning Process.

Thin transparent oxide layers are typically patterned for use in electronic products including semiconductors, displays, and solar cells for applications such as transparent electrodes, insulating films, and encapsulation films. Conventional patterning methods have traditionally been used in photolithography and lift-off processes. Photolithography employs the wet development process, which has disadvantages such as potential undercut effects, swelling, chemical contamination, and high process costs.

Physical Characteristics of Sintered Silver Nanoparticle Inks with Different Sizes during Furnace Sintering.

The influence of nanoparticle (NP) size on the physical characteristics of sintered silver NP ink was studied using four different types of inks. The Ag NP inks were spin-coated on glass substrates with an average thickness of 300 nm. Each sample was sintered for 30 min, with temperatures from 50 °C to 400 °C by an interval of 50 °C.