Pharmacokinetic and pharmacodynamic bioequivalence between regular human insulin (rDNA origin) in 0.9% sodium chloride ready-to-use infusion 1 U/mL and 100 U/mL concentrate diluted to 1 U/mL in healthy males.

Aim: To show pharmacokinetic (PK) and pharmacodynamic (PD) bioequivalence between Myxredlin, a novel, ready-to-use regular human insulin 1 U/mL formulation (BAX-HI), and Novolin R 100 U/mL concentrate diluted to 1 U/mL (NOVO-HI).

Materials And Methods: This phase 1, double-blind, randomized, two-way crossover study compared the PK and PD properties of BAX-HI and NOVO-HI. A total of 58 healthy males received 0.

Power loading limitations in soft x-ray projection lithography.

Soft x-ray projection lithography (SXPL) is an attractive technique for the fabrication of high-speed, high-density integrated circuits. In an SXPL stepper, the x-ray imaging mirrors consist of multilayer coatings deposited onto high precision substrates. The stepper is intended to fabricate ultra-high spatial-resolution structures with a minimum feature size of <0.

Wavelength considerations in soft-x-ray projection lithography.

The choice of the operational wavelength for a soft-x-ray projection lithography system affects a wide variety of system parameters such as optical design, sources, resists, and multilayer mirrors. Several system constraints limit the choice for the operational wavelength. In particular, optical imaging requirements place an upper limit and throughput issues place a lower limit on the wavelength selection.

Front-end design issues in soft-x-ray projection lithography.

We present a protocol for the design of an illumination system (front end) for a soft-x-ray projection lithography tool. The protocol is illustrated by specific front-end designs. The most complete design analysis is for a laser-driven system.

Reflection mask defect repair.

We developed a new technique for the repair of opaque defects on soft-x-ray projection lithography reflection masks by using ion-beam etching and a thin Si overcoat on the multilayer mirror. This technique clears the defect without damaging the multilayer mirror or introducing an absorptive element into the multilayer. Our procedure uses a beam of low atomic number ions (Si or Ar) of reduced beam energy and a thin Si overcoat to protect the multilayer mirror.

Wafer cost analysis for a soft x-ray projection lithography system.

We present a baseline analysis of issues affecting the economic viability of Soft X-Ray Projection Lithography (SXPL). This analysis is intended to serve as a starting point, and to provide an initial assessment of the relative importance of cost factors in a SXPL system. We presume a "conventional" SXPL system design and focus on wafer exposure costs.

Demonstration of guided-wave phenomena at extreme-ultraviolet and soft-x-ray wavelengths.

We report an explicit demonstration of classical guided-wave propagation at XUV and soft-x-ray wavelengths. Experiments were performed using narrow-band synchrotron radiation at 5, 20.8, 21, and 30 nm.

Time-resolved x-ray transmission grating spectrometer for studying laser-produced plasmas.

The development of a new time-resolved x-ray spectrometer is reported in which a free-standing x-ray transmission grating is coupled to a soft x-ray streak camera. The instrument measures continuous x-ray spectra with 20-psec temporal resolution and moderate spectral resolution (deltalambda >/= 1 A) over a broad spectral range (0.1-5 keV) with high sensitivity and large information recording capacity.

Imaging x-ray spectrometer for laser fusion applications.

A gold transmission grating has been coupled to a high-resolution Wolter-design grazing-incidence reflection x-ray microscope to produce an imaging x-ray spectrometer of unprecedented spatial resolution, spectral range, and collection solid angle. In a series of test experiments conducted at 1.75-2 keV, the instrument demonstrated a spectral resolving power, lambda/Deltalambda, of 200 and a 1-D spatial resolution of 1 microm.

Deep-ultraviolet spatial-period division using an excimer laser.

We have used the deep-UV output from an ArF laser and a grating mask with 199-nm spatial period to fabricate a 99.5-nm-period grating pattern in polymethyl methacrylate resist by spatial-period division. For sub 100 nm, lithography of periodic and quasi-periodic patterns (including Fresnel zone plates) by spatial-period division, deep-UV radiation offers a number of advantages over soft x rays.