Copper is considered to be the most promising substrate for the growth of high-quality and large area graphene by chemical vapor deposition (CVD), in particular, on the (111) facet. Because the interactions between graphene and Cu substrates influence the orientation, quality, and properties of the synthesized graphene, we studied the interactions using angle-resolved photoemission spectroscopy. The evolution of both the Shockley surface state of the Cu(111) and the π band of the graphene was measured from the initial stage of CVD growth to the formation of a monolayer.
View Article and Find Full Text PDFMost researchers expect extreme ultraviolet lithography (EUVL) to be used to create patterns below 32 nm in semiconductor devices. An ultrathin EUV photoresist (PR) layer a few nanometers thick is required to further reduce the minimum feature size. Here, we show for the first time that pentacene molecular layers can be employed as a new EUV resist.
View Article and Find Full Text PDFA full-field transmission soft x-ray microscope (TXM) was developed at the Pohang Light Source. With a 2 mm diameter condenser zone plate and a 40 nm outermost-zone-width objective zone plate, the TXM's achieved spatial resolution is better than 50 nm at the photon energy of 500 eV (wavelength: 2.49 nm).
View Article and Find Full Text PDFSmaller nonmetallic nanoparticles are more inert: Metal-insulator transition of Au nanoparticles on silica is closely related to the metal-support charge transfer, which has a strong influence on chemisorption reactivity of Au. Smaller nonmetallic Au nanoparticles are more resistant towards butanethiol chemisorption [picture and graph: see text].The size-dependent variation of the electronic and chemical properties of Au nanoparticles formed on native Si oxide surfaces is investigated using synchrotron radiation photoemission spectroscopy and ultraviolet photoelectron spectroscopy.
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