Interface Optimization and Thermal Conductivity of Cu/Diamond Composites by Spark Plasma Sintering Process.

Cu/Diamond (Cu/Dia) composites are regarded as next-generation thermal dissipation materials and hold tremendous potential for use in future high-power electronic devices. The interface structure between the Cu matrix and the diamond has a significant impact on the thermophysical properties of the composite materials. In this study, Cu/Dia composite materials were fabricated using the Spark Plasma Sintering (SPS) process.

Effect of Bias Voltage on the Microstructure and Photoelectric Properties of W-Doped ZnO Films.

W-doped ZnO (WZO) films were deposited on glass substrates by using RF magnetron sputtering at different substrate bias voltages, and the relationships between microstructure and optical and electrical properties were investigated. The results revealed that the deposition rate of WZO films first decreased from 8.8 to 7.

Effect of V/Mo Atomic Ratio on the Microstructure and Mechanical Properties of MoVCuN Coatings.

To improve the gas ionization ratio, the Mo-V-Cu-N coatings were deposited by pulsed dc magnetron sputtering with assistance from an anode layer ion source, and the influence of the V/Mo atomic ratio was explored with regard to the microstructure and mechanical properties of the coatings. The findings of this study indicated that the MoVCuN coatings exhibited a solid solution phase of FCC B1-MoVN with a prominent (220) preferred orientation, and the deposition rate was found to decrease from 4.7 to 1.

Microstructure and Mechanical Properties of AlTiVCuN Coatings Prepared by Ion Source-Assisted Magnetron Sputtering.

The AlTiVCuN coatings were deposited by magnetron sputtering with anode layer ion source (ALIS) assistance, and the microstructure and mechanical properties were significantly affected by the ion source power. With increasing the ion source power from 0 to 1.0 kW, the deposition rate decreased from 2.

Polishing of Silicon Nitride Ceramic Balls by Clustered Magnetorheological Finish.

In this study, a novel finishing method, entitled clustered magnetorheological finish (CMRF), was proposed to improve surface finish of the silicon nitride ( Si 3 N 4 ) balls with ultra fine precision. The effects of different polishing parameters including rotation speeds, eccentricities and the machining gaps on surface finish of Si 3 N 4 balls were investigated by analyzing the roughness, sphericity and the micro morphology of the machined surface. The experimental results showed that the polishing parameters significantly influenced the surface finish.