Integrated Network Pharmacology and Molecular Docking to Explore the Mechanisms of Ningshen Wendan Decoction in the Treatment of Schizophrenia.

Objective: Schizophrenia (SCZ) is a prevalent chronic mental disorder characterized by a high recurrence rate and significant disability. Currently, no satisfactory pharmacological treatments have been identified. Although Ningshen Wendan decoction (NSWDD) has shown promising results in improving cognitive function in patients with schizophrenia, its underlying mechanism of action remains unclear.

The Interrelationships between Cytokines and Schizophrenia: A Systematic Review.

Schizophrenia (SCZ) imposes a significant burden on patients and their families because of its high prevalence rate and disabling nature. Given the lack of definitive conclusions regarding its pathogenesis, physicians heavily rely on patients' subjective symptom descriptions for diagnosis because reliable diagnostic biomarkers are currently unavailable. The role of the inflammatory response in the pathogenesis of SCZ has been supported by some studies.

The Role of microRNA in Schizophrenia: A Scoping Review.

Schizophrenia is a serious mental disease that is regulated by multiple genes and influenced by multiple factors. Due to the complexity of its etiology, the pathogenesis is still unclear. MicroRNAs belong to a class of small non-coding RNAs that are highly conserved in endogenous evolution and play critical roles in multiple biological pathways.

A simple all-fiber comb filter based on the combined effect of multimode interference and Mach-Zehnder interferometer.

A polarization-dependent all-fiber comb filter based on a combination effect of multimode interference and Mach-Zehnder interferometer was proposed and demonstrated. The comb filter was composed with a short section of multimode fiber (MMF) fusion spliced with a conventional single mode fiber on the one side and a short section of a different type of optical fiber on the other side. The second type of optical fiber is spliced to the MMF with a properly designed misalignment.

Contamination-resistant silica antireflective coating with closed ordered mesopores.

Porous silica optical antireflective (AR) coatings prepared by traditional sol-gel method have been extensively used for high power laser systems, but a serious drawback is that contamination existing in the high vacuum is easily absorbed by the disordered open pore structure, resulting in a fast decrease in transmittance. To improve the stability of transmittance in vacuum, a contamination-resistant silica AR coating with ordered mesopores completely closed by hydrophobic-oleophobic groups was successfully developed on a fused quartz substrate. The ordered mesopores in the coating were controlled under the direction of surfactant F127 via an evaporation-induced-self-assembling process and then were closed by post-grafting long chain fluoroalkylsilane.

Sol-gel preparation of hydrophobic silica antireflective coatings with low refractive index by base/acid two-step catalysis.

Hydrophobic antireflective coatings with a low refractive index were prepared via a base/acid-catalyzed two-step sol-gel process using tetraethylorthosilicate (TEOS) and methyltriethoxysilane (MTES) as precursors, respectively. The base-catalyzed hydrolysis of TEOS leads to the formation of a sol with spherical silica particles in the first step. In the second step, the acid-catalyzed MTES hydrolysis and condensation occur at the surface of the initial base-catalyzed spherical silica particles, which enlarge the silica particle size from 12.

Ultralow-refractive-index optical thin films through nanoscale etching of ordered mesoporous silica films.

A great deal of intensive research has been conducted to obtain high-quality transparent ultralow-refractive-index and ultralow-dielectric-constant thin films for microptics and microelectronics applications. Here, we report a simple procedure to prepare highly porous silica thin films with high optical quality and water resistance through nano-etching of mesoporous silica films followed by fluoroalkylsilane surface modification. The films possess an ultralow refractive index of 1.