Publications by authors named "Ha-Na Kang"

Background: To evaluate how intrauterine stress affects extremely premature infants in terms of intrauterine growth restriction. We hypothesized that extremely premature infants with mildly-low ponderal index (MPI) would have better neonatal outcomes.

Methods: We selected 2,721 subjects of 23 to 28 weeks of gestation between 2013 and 2015 from Korean Neonatal Network database.

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Background: Local allergic rhinitis (LAR) is rhinitis with a localized nasal allergic response in the absence of systemic allergy. This study aimed to evaluate the pathogenesis specific to LAR compared with allergic rhinitis (AR) and nonallergic rhinitis (NAR) by using cytokines from polypous tissues.

Methods: We recruited 43 patients with AR (n = 15; mean age, 17.

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Background: Fever rather than diarrhea or vomiting was the most common symptom of neonatal rotavirus (RV) infection in our previous study. We investigated whether RV infection is a major cause of neonatal fever and compared the clinical characteristics of bacterial infection, viral infection and unknown causes of neonatal fever.

Method: We reviewed the electronic medical records of 48 newborns aged ≤28 days who were admitted to the Special Care Nursery of Hanyang University Guri Hospital for fever (≥38°C) from 2005 to 2009.

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Photoacid generators (PAGs) have been widely used as a key component for improving photoresist performance. The acid diffusion influences on the photoresist characteristics of resolution and line edge roughness (LER). The PAG bound polymer resist has been a key component for solving the problems of PAG aggregation and acid diffusion control.

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A photoacid generator (PAG) is a component of chemical amplification photoresists (CAR). The most widely used PAG in CAR system is triphenyl onium salt which is well known to one of the best leaving groups from various radiation. Acid diffusion influences resist characteristics in area such as resolution and linewidth control.

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Photoacid generator (PAG) has been widely used as a key component in photoresist for high-resolution patterning with high sensitivity. A novel acrylic monomer, triphenylsulfonium salt methyl methacrylate (TPSMA), was synthesized and includes triphenylsulfonium triflate as a PAG. The poly(MMA-co-TPSMA) (PMT) as a polymer-bound PAG was synthesized with methyl methacrylate (MMA) and TPSMA for electron beam lithography.

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