Rapid Octadecylphosphonic Acid Self-Assembled Monolayer Formation on Cu for Etch Inhibition: Characterizations Using Sum Frequency Generation Vibrational Spectroscopy.

Self-assembled monolayers (SAMs) can be used to modify surface properties in a large area, which have wide applications ranging from corrosion inhibition, electronic device fabrication, oil/water separation, to biosensors. In industry, it is required to deposit a monolayer on copper substrate for etch inhibition within a short period of time. This study developed a simple method to satisfy such a need in industry.