Publications by authors named "H G Svavarsson"

Article Synopsis
  • Accurate and rapid breath monitoring plays a crucial role in healthcare, particularly for diagnosing conditions like sleep apnea and detecting early physiological disorders; however, existing devices are often uncomfortable and expensive.
  • This paper discusses the development of a sensitive respiratory sensor using silicon nanowires (SiNWs) created through a cost-effective technique involving metal-assisted chemical etching, emphasizing the importance of reducing production costs by exploring aluminum (Al) electrodes as an alternative to gold (Au).
  • The study compares the performance of SiNWs breath sensors with p-type and n-type silicon, observing that the choice of electrode material affects the sensor's response, ultimately highlighting the need for further research to understand the underlying mechanics of these interactions.
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Silicon nanowires (SiNWs) are known to exhibit a large piezoresistance (PZR) effect, making them suitable for various sensing applications. Here, we report the results of a PZR investigation on randomly distributed and interconnected vertical silicon nanowire arrays as a pressure sensor. The samples were produced from p-type (100) Si wafers using a silver catalyzed top-down etching process.

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Films of SiGe nanocrystals (NCs) in oxide have the advantage of tuning the energy band gap by adjusting SiGe NCs composition and size. In this study, SiGe-SiO amorphous films were deposited by magnetron sputtering on Si substrate followed by rapid thermal annealing at 700, 800 and 1000 °C. We investigated films with Si:Ge:SiO compositions of 25:25:50 vol.

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Multilayer structures comprising of SiO/SiGe/SiO and containing SiGe nanoparticles were obtained by depositing SiO layers using reactive direct current magnetron sputtering (dcMS), whereas, Si and Ge were co-sputtered using dcMS and high-power impulse magnetron sputtering (HiPIMS). The as-grown structures subsequently underwent rapid thermal annealing (550-900 °C for 1 min) in N ambient atmosphere. The structures were investigated using X-ray diffraction, high-resolution transmission electron microscopy together with spectral photocurrent measurements, to explore structural changes and corresponding properties.

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SiGe nanoparticles dispersed in a dielectric matrix exhibit properties different from those of bulk and have shown great potential in devices for application in advanced optoelectronics. Annealing is a common fabrication step used to increase crystallinity and to form nanoparticles in such a system. A frequent downside of such annealing treatment is the formation of insulating SiO layer at the matrix/SiGe interface, degrading the optical properties of the structure.

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