Deposition of TiN films on Co-Cr for improving mechanical properties and biocompatibility using reactive DC sputtering.

This study reports the deposition of TiN films on Co-Cr substrates to improve the substrates' mechanical properties and biological properties. In particular, the argon to nitrogen (Ar:N(2)) gas flow ratio was adjusted to control the microstructure of the TiN films. A Ti interlayer was also used to enhance the adhesion strength between the Co-Cr substrate and TiN films.