Near room temperature reduction of graphene oxide Langmuir-Blodgett monolayers by hydrogen plasma.

Langmuir-Blodgett monolayer sheets of graphene oxide (GO) were transferred onto Si and SiO2/Si, and subjected to hydrogen plasma treatment near room temperature. GO monolayers were morphologically stable at low power (15 W) plasma treatment, for durations up to 2 min and temperatures up to 120 °C. GO monolayers reduced under optimized plasma treatment conditions (30 s duration at 50 °C) exhibit a sheet thickness of (0.

Study of simultaneous reduction and nitrogen doping of graphene oxide Langmuir-Blodgett monolayer sheets by ammonia plasma treatment.

Graphene oxide (GO) monolayer sheets, transferred onto Si by the Langmuir-Blodgett technique, were subjected to ammonia plasma treatment at room temperature with the objective of simultaneous reduction and doping. Scanning electron microscopy and atomic force microscopy studies show that plasma treatment at a relatively low power (∼10 W) for up to 15 min does not affect the morphological stability and monolayer character of GO sheets. X-ray photoelectron spectroscopy has been used to study de-oxygenation of GO monolayers and the incorporation of nitrogen in graphitic-N, pyrrolic-N and pyridinic-N forms due to the plasma treatment.

Growth of CdS nanocrystallites on graphene oxide Langmuir-Blodgett monolayers.

Large area GO-Cd composite Langmuir-Blodgett monolayers were transferred onto Si substrate by introducing Cd(2+) ions into the subphase. The changes in the behaviour of the Langmuir monolayer isotherm in the presence of Cd(2+) ions are attributed to changes in the microstructure and density of the GO sheets on the subphase surface. The uptake of Cd onto the GO monolayers and the effect of subsequent sulphidation were investigated by AFM, FTIR, Raman, XPS and HRTEM techniques.