Ultrasonic-assisted MoS/GO/TiO ceramic coatings: Enhancing anti-friction performance through dual-interface optimization.

Ceramic coatings containing two-dimensional materials (2D materials) provide effective protection for light alloys during wear, significantly improving their anti-friction performance. MoS has proven highly effective in enhancing the anti-friction performance of ceramic coatings, particularly when synthesized via plasma electrolytic oxidation (PEO). However, dislocation pinning due to the incoherent interfaces in MoS/TiO coatings tends to cause localized stress concentrations and brittle fracture, requiring effectively improve nanomechanical properties by optimizing interface design.

Structure and Infrared Emissivity Properties of the MAO Coatings Formed on TC4 Alloys in K₂ZrF₆-Based Solution.

Micro-arc oxidation (MAO) ceramic coatings were formed on TC4 alloy surface in silicate and metaphosphate electrolytes based with K₂ZrF₆ for various concentrations. X-ray diffraction (XRD), Scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS) were used to characterize the phase composition, microstructure and chemical compositions of the coatings. The infrared emissivity of the coatings was measured at 50 °C in a wavelength range of 8-20 µm.

Influence of KMnO₄ Concentrationon Infrared Emissivity of Coatings Formed on TC4 Alloys by Micro-Arc Oxidation.

Ceramic coatings with high emissivity were fabricated on TC4 alloys by micro-arc oxidation technique (MAO) in mixed silicate and phosphate electrolytes with varying KMnO₄ addition. The microstructure, phase and chemical composition were characterized by scanning electron microscope (SEM), X-ray diffraction (XRD), and X-ray photoelectron spectroscopy (XPS), and the infrared emissivity of the MAO coatings was measured in a waveband of 5-20 μm. The results show that the thickness of the coatings increased with the addition of KMnO₄, but the roughness of the coatings first decreased and then increased slightly due to the inhibitory effect of KMnO₄ on Na₂SiO₃ deposition.