Measurement and compensation of a stitching error in a DMD-based step-stitching photolithography system.

The step-stitching issue occurring in digital micromirror device (DMD)-based step lithography, which refers to overlapping and misalignment, has dramatically influenced the overall accuracy of the exposed patterns. To address this technical challenge, this paper proposes a testing method to resolve the system tolerance parameters, inclination angle with 0.060±0.