Nanoimprinting techniques for large-area three-dimensional negative index metamaterials with operation in the visible and telecom bands.

We report advances in materials, designs, and fabrication schemes for large-area negative index metamaterials (NIMs) in multilayer "fishnet" layouts that offer negative index behavior at wavelengths into the visible regime. A simple nanoimprinting scheme capable of implementation using standard, widely available tools followed by a subtractive, physical liftoff step provides an enabling route for the fabrication. Computational analysis of reflection and transmission measurements suggests that the resulting structures offer negative index of refraction that spans both the visible wavelength range (529-720 nm) and the telecommunication band (1.

Large-area flexible 3D optical negative index metamaterial formed by nanotransfer printing.

Negative-index metamaterials (NIMs) are engineered structures with optical properties that cannot be obtained in naturally occurring materials. Recent work has demonstrated that focused ion beam and layer-by-layer electron-beam lithography can be used to pattern the necessary nanoscale features over small areas (hundreds of µm(2)) for metamaterials with three-dimensional layouts and interesting characteristics, including negative-index behaviour in the optical regime. A key challenge is in the fabrication of such three-dimensional NIMs with sizes and at throughputs necessary for many realistic applications (including lenses, resonators and other photonic components).

Three-dimensional nanostructures formed by single step, two-photon exposures through elastomeric penrose quasicrystal phase masks.

We describe the fabrication of unusual classes of three-dimensional (3D) nanostructures using single step, two-photon exposures of photopolymers through elastomeric phase masks with 5-fold, Penrose quasicrystalline layouts. Confocal imaging, computational studies, and 3D reconstructions reveal the essential aspects of the flow of light through these quasicrystal masks. The resulting nanostructures show interesting features, including quasicrystalline layouts in planes parallel to the sample surfaces, with completely aperiodic variations through their depths, consistent with the optics.

Three-dimensional nanofabrication with elastomeric phase masks.

This Feature Article reviews recent work on an optical technique for fabricating, in a single exposure step, three-dimensional (3D) nanostructures with diverse structural layouts. The approach, which we refer to as proximity field nanopatterning, uses conformable, elastomeric phase masks to pattern thick layers of transparent, photosensitive materials in a conformal contact mode geometry. Aspects of the optics, the materials, and the physical chemistry associated with this method are outlined.

Molded transparent photopolymers and phase shift optics for fabricating three dimensional nanostructures.

This paper introduces approaches that combine micro/nanomolding, or nanoimprinting, techniques with proximity optical phase mask lithographic methods to form three dimensional (3D) nanostructures in thick, transparent layers of photopolymers. The results demonstrate three strategies of this type, where molded relief structures in these photopolymers represent (i) fine (<1 microm) features that serve as the phase masks for their own exposure, (ii) coarse features (>1 microm) that are used with phase masks to provide access to large structure dimensions, and (iii) fine structures that are used together phase masks to achieve large, multilevel phase modulations. Several examples are provided, together with optical modeling of the fabrication process and the transmission properties of certain of the fabricated structures.