Publications by authors named "Gregoire R N Defoort-Levkov"
Ultralow-energy amorphization of contaminated silicon samples investigated by molecular dynamics.
Beilstein J Nanotechnol
August 2023
Ion beam processes related to focused ion beam milling, surface patterning, and secondary ion mass spectrometry require precision and control. Quality and cleanliness of the sample are also crucial factors. Furthermore, several domains of nanotechnology and industry use nanoscaled samples that need to be controlled to an extreme level of precision.
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- Focused ion beams (FIB) are widely used in nanotechnology for tasks like surface analysis and nanomachining, requiring precise control of ion-beam processes.
- This study uses molecular dynamics simulations to examine how water contamination on a silicon surface affects the sputtering process when bombarded by 100 eV argon ions at varying angles of incidence.
- While the overall sputtering yield of silicon remains consistent, the amount of hydrogen and oxygen atoms ejected during sputtering varies significantly with incidence angle, peaking at angles between 70 and 80°, where the ejected fraction increases from 25% to 65%.