Publications by authors named "Gosse de Vries"
Article Synopsis
- Proper diagnostics of intense free-electron laser (FEL) X-ray pulses is crucial for both data analysis and protecting equipment in modern research facilities.
- This paper presents the first characterization of a defocused 13.5-nm beam from the free-electron laser in Hamburg (FLASH) using a technique that analyzes material removal in poly(methyl methacrylate) (PMMA) due to multiple laser pulses.
- The study proposes a new algorithm for accurately reconstructing the beam fluence profile, demonstrating that the experimental results closely align with theoretical models of desorption response functions, applicable at various pulse repetition rates.
Ruthenium is a perspective material to be used for XUV mirrors at free-electron laser facilities. Yet, it is still poorly studied in the context of ultrafast laser-matter interaction. In this work, we present single-shot damage studies of thin Ru films irradiated by femtosecond XUV free-electron laser pulses at FLASH.
View Article and Find Full Text PDFThe durability of grazing- and normal-incidence optical coatings has been experimentally assessed under free-electron laser irradiation at various numbers of pulses up to 16 million shots and various fluence levels below 10% of the single-shot damage threshold. The experiment was performed at FLASH, the Free-electron LASer in Hamburg, using 13.5 nm extreme UV (EUV) radiation with 100 fs pulse duration.
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