O-vacancies in (i) nano-crystalline HfO2 and (i) non-crystalline SiO2 and Si3N4 studied by X-ray absorption spectroscopy.

Performance and reliability in semiconductor devices are limited by electronically active defects, primarily O-atom and N-atom vacancies. Synchrotron X-ray spectroscopy results, interpreted in the context of two-electron multiplet theories, have been used to analyze conduction band edge, and O-vacancy defect states in nano-crystalline transition metal oxides, e.g.

Spectroscopic detection of hopping induced mixed valence for Ti and Sc in GdSc1-xTixO3 for x > 0.165.

Only two of the first row transition metals have elemental oxides that are either ferro- or ferri-magnetic. These are CrO2 and Fe3O4. The electron spin alignment that promotes the ferro(i)magnetism is associated with a double exchange mechanism that requires mixed valence as well as metallic conductivity.

Remote plasma enhanced chemical deposition of non-crystalline GeO2 on Ge and Si substrates.

Non-crystalline GeO2 films remote were plasma deposited at 300 degrees C onto Ge substrates after a final rinse in NH4OH. The reactant precursors gas were: (i) down-stream injected 2% GeH4 in He as the Ge precursor, and (ii) up-stream, plasma excited O2-He mixtures as the O precursor. Films annealed at 400 degrees C displayed no evidence for loss of O resulting in Ge sub-oxide formation, and for a 5-6 eV mid-gap absorption associated with formation of GeOx suboxide bonding, x < 2.

Remote plasma processing of sapphire substrates for deposition of TiN and TiO2.

The paper uses remote plasma assisted deposition, oxidation and nitridation processes for depositing thin films of metallic TiN on crystalline sapphire (0001) substrates. These films on sapphire substrates are being studied as window materials for high power radio frequency (RF) power tubes. A sequence of four process steps has been performed in a reactor chamber that isolates the deposition and surface-processing chamber from the plasma generation region.

Nano-regime Length Scales Extracted from the First Sharp Diffraction Peak in Non-crystalline SiO(2) and Related Materials: Device Applications.

This paper distinguishes between two different scales of medium range order, MRO, in non-crystalline SiO(2): (1) the first is ~0.4 to 0.5 nm and is obtained from the position of the first sharp diffraction peak, FSDP, in the X-ray diffraction structure factor, S(Q), and (2) the second is ~1 nm and is calculated from the FSDP full-width-at-half-maximum FWHM.