Plasma functionalization of AFM tips for measurement of chemical interactions.

In this paper, a new, fast, reproducible technique for atomic force microscopy (AFM) tips functionalization used for chemical interaction measurements is described. Precisely, the deposition of an aminated precursor is performed through plasma-enhanced chemical vapor deposition (PECVD) in order to create amine functional groups on the AFM tip and cantilever. The advantages of the precursor, aminopropyltriethoxysilane (APTES), were recently demonstrated for amine layer formation through PECVD deposition on polymeric surfaces.

Reactive amine surfaces for biosensor applications, prepared by plasma-enhanced chemical vapour modification of polyolefin materials.

Here we have demonstrated a solventless plasma-based process that integrates low-cost, high throughput, high reproducibility and ecofriendly process for the functionalization of the next-generation point-of-care device platforms. Amine functionalities were deposited by plasma-enhanced chemical vapour deposition (PECVD) using a new precursor. The influence of the plasma RF power and the deposition time on surfacial properties, as well as their effect on the reactivity and content of amino groups was investigated.

Alkanethiol-oxidized copper interface: the critical influence of concentration.

In this contribution, self-assembled monolayers of n-dodecanethiol (C(12)H(25)SH) at different concentrations on polycrystalline copper have been elaborated. Using XPS, PM-IRRAS, and electrochemical methods (cyclic voltammetry curves and cathodic desorption), the effect of the C(12)H(25)SH concentration on the reduction of the oxide layer has been studied. In all cases, a monolayer of good quality has been obtained.