This work uses the direct current magnetron sputtering (DCMS) of equi-atomic (AlTiZrHfTa) and Si targets in dynamic sweep mode to deposit nano-layered (AlTiZrHfTa)N/SiN refractory high-entropy coatings (RHECs). Transmission electron microscopy (TEM), field emission scanning electron microscopy (FESEM), thermogravimetric analysis (TGA), X-ray diffraction (XRD), and X-ray photoelectron spectroscopy (XPS) are used to investigate the effect of Si addition on the oxidation behavior of the nano-layered coatings. The Si-free nitride coating exhibits FCC structure and columnar morphology, while the Si-doped nitride coatings present a FCC (AlTiZrHfTa)N/amorphous-SiN nano-layered architecture.
View Article and Find Full Text PDFThree-dimensional (3D) printing is a very flexible process to design various objects of original shapes. Previous works highlighted the preparation of new multimaterials composed of an original sandwich structure made of the ethylene vinyl acetate copolymer containing 30 wt % of aluminum trihydroxide in which a hydrogel phase made of agar and vermiculite was incorporated. This original material revealed an extremely low heat release rate (HRR) (with a reduction of 86 and 64% with regard to the peak of the HRR and total heat release, respectively, when compared to the same sample without hydrogel filling) during its heat exposure at 50 kW/m according to the mass loss cone calorimetry test.
View Article and Find Full Text PDFEnviron Sci Pollut Res Int
September 2020
Diamond-like carbon (DLC) and titanium-doped DLC coatings were prepared by hybrid PECVD/direct current magnetron sputtering (DCMS). In this study, we show that the operating conditions of titanium-doped DLC coatings used for implants in surgical devices significantly modify their surface properties and consequently their interaction with cells. The coatings showed uniform distribution on the substrate and their biocompatibility was tested by way of rat calvaria osteoblasts.
View Article and Find Full Text PDFThis article presents the evidence for the significant effect of copper accelerating the bacterial inactivation on Ti-Nb-Ta-Zr (TNTZ) sputtered films on glass up to a Cu content of 8.3 at.%.
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