Publications by authors named "Frank Scholze"

Article Synopsis
  • The semiconductor industry is evolving, necessitating improved measurement techniques for analyzing small and complex nanostructures, particularly gratings on the nanometer scale.
  • A new compact measurement chamber has been developed to simultaneously capture both scattered signals and fluorescence from these nanoscale grating samples, allowing for a comprehensive analysis.
  • Initial experiments using this setup, situated at PTB's soft x-ray radiometry beamline in BESSY II, Berlin, have focused on testing industry-relevant structures to validate the system's specifications and capabilities.
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We report on determining the optical constants of Ta in the sub-extreme ultraviolet (EUV) spectral range 5.0-24.0 nm from the angle-dependent reflectance (ADR) measured using monochromatized synchrotron radiation.

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Coordinates of surface outcrops in the Tambach Formation (Rotliegend Group, early Permian) as well as stratigraphic dip azimuth and dip angle values were measured newly during recent mapping activities in the Tambach-Dietharz sedimentary basin. In total, 304 localities of the Tambach Formation were measured. The dataset includes stratigraphic dip measurements of in-situ beds from all subunits of the Tambach Formation (i.

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The determination of fundamental optical parameters is essential for the development of new optical elements such as mirrors, gratings, or photomasks. Especially in the extreme ultraviolet (EUV) and soft x-ray spectral range, the existing databases for the refractive indices of many materials and compositions are insufficient or are a mixture of experimentally measured and calculated values from atomic scattering factors. Since the physical properties of bulk materials and thin films with thicknesses in the nanometer range are not identical, measurements need to be performed on thin layers.

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Increasing miniaturization and complexity of nanostructures require innovative metrology solutions with high throughput that can assess complex 3D structures in a non-destructive manner. EUV scatterometry is investigated for the characterization of nanostructured surfaces and compared to grazing-incidence small-angle X-ray scattering (GISAXS). The reconstruction is based on a rigorous simulation using a Maxwell solver based on finite-elements and is statistically validated with a Markov-Chain-Monte-Carlo sampling method.

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We describe four upper Lower Triassic to lower Middle Triassic clam shrimp-bearing intervals from Mallorca, which include the clam shrimp species Hornestheria sp. aff. Hornestheria sollingensis and several other forms of carapace valve morphology: Hornestheria? Morphotype 1, Hornestheria? Morphotype 2, and other undetermined carapace valves.

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The increasing importance of well-controlled ordered nanostructures on surfaces represents a challenge for existing metrology techniques. To develop such nanostructures and monitor complex processing constraints fabrication, both a dimensional reconstruction of nanostructures and a characterization (ideally a quantitative characterization) of their composition is required. In this work, we present a soft x-ray fluorescence-based methodology that allows both of these requirements to be addressed at the same time.

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Periodic nanostructures are fundamental elements in optical instrumentation as well as basis structures in integrated electronic circuits. Decreasing sizes and increasing complexity of nanostructures have made roughness a limiting parameter to the performance. Grazing-incidence small-angle X-ray scattering is a characterization method that is sensitive to three-dimensional structures and their imperfections.

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The geometry of a Si3N4 lamellar grating was investigated experimentally with reference-free grazing-incidence X-ray fluorescence analysis. While simple layered systems are usually treated with the matrix formalism to determine the X-ray standing-wave field, this approach fails for laterally structured surfaces. Maxwell solvers based on finite elements are often used to model electrical field strengths for any 2D or 3D structures in the optical spectral range.

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The durability of grazing- and normal-incidence optical coatings has been experimentally assessed under free-electron laser irradiation at various numbers of pulses up to 16 million shots and various fluence levels below 10% of the single-shot damage threshold. The experiment was performed at FLASH, the Free-electron LASer in Hamburg, using 13.5 nm extreme UV (EUV) radiation with 100 fs pulse duration.

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Grazing-incidence small-angle X-ray scattering (GISAXS) is often used as a versatile tool for the contactless and destruction-free investigation of nano-structured surfaces. However, due to the shallow incidence angles, the footprint of the X-ray beam is significantly elongated, limiting GISAXS to samples with typical target lengths of several millimetres. For many potential applications, the production of large target areas is impractical, and the targets are surrounded by structured areas.

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We investigate the influence of the Mo-layer thickness on the EUV reflectance of Mo/Si mirrors with a set of unpolished and interface-polished Mo/Si/C multilayer mirrors. The Mo-layer thickness is varied in the range from 1.7 nm to 3.

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Cr/Sc multilayer systems can be used as near-normal incidence mirrors for the water window spectral range. It is shown that a detailed characterization of these multilayer systems with 400 bilayers of Cr and Sc, each with individual layer thicknesses <1 nm, is attainable by the combination of several analytical techniques. EUV and X-ray reflectance measurements, resonant EUV reflectance across the Sc edge, and X-ray standing wave fluorescence measurements were used.

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Off-plane reflection gratings were previously predicted to have different efficiencies when the incident light is polarized in the transverse-magnetic (TM) versus transverse-electric (TE) orientations with respect to the grating grooves. However, more recent theoretical calculations which rigorously account for finitely conducting, rather than perfectly conducting, grating materials no longer predict significant polarization sensitivity. We present the first empirical results for radially ruled, laminar groove profile gratings in the off-plane mount, which demonstrate no difference in TM versus TE efficiency across our entire 300-1500 eV bandpass.

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The fabrication and characterization of a large-area high-dispersion blazed grating for soft X-rays based on an asymmetric-cut multilayer structure is reported. An asymmetric-cut multilayer structure acts as a perfect blazed grating of high efficiency that exhibits a single diffracted order, as described by dynamical diffraction throughout the depth of the layered structure. The maximum number of grating periods created by cutting a multilayer deposited on a flat substrate is equal to the number of layers deposited, which limits the size of the grating.

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Checking the performance of energy dispersive X-ray spectrometers as well as validation of the results obtained with energy dispersive X-ray spectrometry (EDX) at a scanning electron microscope (SEM) involve the use of (certified) reference and dedicated test materials. This paper gives an overview on the test materials mostly employed by SEM/EDX users and accredited laboratories as well as on those recommended in international standards. The new BAM reference material EDS-CRM, which is currently in the process of certification, is specifically designed for the characterization of EDS systems at a SEM through calibration of the spectrometer efficiency in analytical laboratories in a simple manner.

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In this paper, we present measurements of angle- and wavelength-resolved diffuse scattering of EUV radiation on a Mo/Si multilayer. Our sample is optimized for high reflectivity at 13.5 nm wavelength near-normal incidence.

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Researchers require infrastructures that ensure a maximum of accessibility, stability and reliability to facilitate working with and sharing of research data. Such infrastructures are being increasingly summarized under the term Research Data Repositories (RDR). The project re3data.

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The accurate determination of critical dimensions and roughness is necessary to ensure the quality of photoresist masks that are crucial for the operational reliability of electronic components. Scatterometry provides a fast indirect optical nondestructive method for the determination of profile parameters that are obtained from scattered light intensities using inverse methods. We illustrate the effect of line roughness on the reconstruction of grating parameters employing a maximum likelihood scheme.

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Grazing incidence small-angle x-ray scattering (GISAXS) and x-ray reflectometry (XRR) have been used to investigate structural parameters, especially period length, line width, groove width, and line height, of grating test structures in the sub-micron range. The gratings are e-beam written structures on a quartz substrate with a fixed period length, but different line and groove widths, covered by a layer of ruthenium. A Ru layer thickness of 9.

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The influence of edge roughness in angle-resolved scatterometry at periodically structured surfaces is investigated. A good description of the radiation interaction with structured surfaces is crucial for the understanding of optical imaging processes such as, e.g.

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Scatterometry is frequently used as a non-imaging indirect optical method to reconstruct the critical dimensions (CD) of periodic nanostructures. A particular promising direction is EUV scatterometry with wavelengths in the range of 13 - 14 nm. The conventional approach to determine CDs is the minimization of a least squares function (LSQ).

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It is essential for the strategy of open access self-archiving that scientific authors are given comprehensive information on publisher copyright policies. DINI, the German Initiative for Networked Information, has developed a German (and potentially multilingual) interface to the English SHERPA/RoMEO service to provide additional information on German publishers' open access policies. As a next step, this interface was enhanced to an integration layer combining different sources on publisher copyright policies.

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A calibration procedure for the detection efficiency of energy dispersive X-ray spectrometers (EDS) used in combination with scanning electron microscopy (SEM) for standardless electron probe microanalysis (EPMA) is presented. The procedure is based on the comparison of X-ray spectra from a reference material (RM) measured with the EDS to be calibrated and a reference EDS. The RM is certified by the line intensities in the X-ray spectrum recorded with a reference EDS and by its composition.

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