Damage threshold measurements on EUV optics using focused radiation from a table-top laser produced plasma source.

We present first damage threshold investigations on EUV mirrors and substrate materials using a table-top laser produced plasma source. A Schwarzschild objective with Mo/Si multilayer coatings for the wavelength of 13.5 nm was adapted to the source, generating an EUV spot of 5 microm diameter with a maximum energy density of approximately 6.

Radiation damage resistance of AlGaN detectors for applications in the extreme-ultraviolet spectral range.

We report on the fabrication of aluminum gallium nitride (AlGaN) Schottky-photodiode-based detectors. AlGaN layers were grown using metal-organic chemical vapor deposition (MOCVD) on Si(111) wafers. The diodes were characterized at a wavelength of 13.

XUV laser-plasma source based on solid Ar filament.

We present a laser driven soft x-ray source based on a novel solid argon filament. The continuously flowing micron-sized filament (diameter approximately 56 microm, flow speed approximately 5 mms) was used as a laser target in order to generate a plasma source of high brightness in the "water window" (2.2-4.