Fused Metalloporphyrin Thin Film with Tunable Porosity via Chemical Vapor Deposition.

Porous and highly conjugated multiply fused porphyrin thin films are prepared from a fast and single-step chemical vapor deposition approach. While the solution-based coupling of porphyrins is usually undertaken at room temperature, the gas phase reaction of nickel(II) 5,15-(diphenyl)porphyrin and iron(III) chloride (FeCl) is investigated for temperatures as high as 200 °C. Helium ion and atomic force microscopy, supported by weight and thickness measurements, shows a drastic decrease of the fused porphyrin thin film's density accompanied by the formation of a mesoporous morphology upon increase of the reaction temperature.

Thermoresponsive Water-Soluble Polymer Layers and Water-Stable Copolymer Layers Synthesized by Atmospheric Plasma Initiated Chemical Vapor Deposition.

The growth of thermoresponsive layers with the atmospheric pressure plasma-initiated chemical vapor deposition (AP-PiCVD) process is reported for the first time. N-vinyl caprolactam (NVCL) was successfully homopolymerized and copolymerized with ethylene glycol dimethacrylate (EGDMA), yielding water-soluble and water-stable thermoresponsive thin films, respectively. Strong chemical retention and high thermoresponsivity were achieved, highlighting the ability of AP-PiCVD to grow functional conventional homopolymers and copolymers.