Sulfinates and sulfonates as high performance co-initiators in CQ based systems: Towards aromatic amine-free systems for dental restorative materials.

Objective: The aim of our study is to develop amine-free photoinitiating systems (PISs) for the polymerization of representative dental methacrylate resins under blue light irradiation. PISs based on camphorquinone (CQ)/sulfinate and CQ/sulfonate, eventually in combination with an iodonium salt, are proposed and compared to the well-established CQ/amine system. The polymerization performances of thick (1.

Glucose oxidase and glucose for redox-initiating the free radical copolymerization of N-(ferrocenoylmethyl)acrylamide in aqueous cyclodextrin solution.

The glucose oxidase and glucose mediated formation of amphipilic copolymers of N-(ferrocenoylmethyl)acrylamide (NFMA) and N,N-diethylacrylamide (DEA) in aqueous cyclodextrin solution is presented. Thereby, NFMA is not only a comonomer but also part of the redox initiation system. The obtained copolymers contain NFMA units between 1 and 10 mol%.

Redox-switchable supramolecular graft polymer formation via ferrocene-cyclodextrin assembly.

The redox switchable formation of very well-defined supramolecular graft polymers in aqueous solution driven by host-guest interactions between ferrocene (Fc) and cyclodextrin (CD) is presented. The Fc-containing acrylic backbone copolymer (PDMA-stat-Fc) is prepared via reversible addition-fragmentation chain transfer (RAFT) copolymerization of N,N-dimethyl-acrylamide (DMA) and the novel monomer N-(ferrocenoylmethyl)acrylamide (NFMA). Via the RAFT process, copolymers containing variable Fc ratios (5-10 mol%) are prepared, affording polymers of molecular masses of close to 11,000 g mol(-1) and molar mass dispersities (Đ) of 1.

Pattern transfer during deposition and fixation of oligomeric bisphenol A on pre-structured copper surfaces.

Pattern transfer during deposition of oligomeric bisphenol A (OBA) on pre-structured Cu surfaces is investigated by means of a combined experimental-computational approach. Aiming for quantitative prediction of experiments, as characterized by atomic force microscopy (AFM), we explore the capabilities of stochastic rate equations to quantitatively account for the spatio-temporal evolution of surface topography. While surface diffusion and deposition noise constitute the main mechanisms, pattern transfer is affected by the inclusion of retardation in the interface potential, which appears to be necessary beyond a critical initial surface slope.