Publications by authors named "Fernand Wieder"

Deep-UV (DUV) laser was used to directly write indium-gallium-zinc-oxide (IGZO) precursor solution and form micro and nanoscale patterns. The directional DUV laser beam avoids the substrate heating and suppresses the diffraction effect. A IGZO precursor solution was also developed to fulfill the requirements for direct photopatterning and for achieving semi-conducting properties with thermal annealing at moderate temperature.

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Deep-UV lithography using high-efficiency phase mask has been developed to print 100 nm period grating on sol-gel based thin layer. High efficiency phase mask has been designed to produce a high-contrast interferogram (periodic fringes) under water immersion conditions for 244 nm laser. The demonstration has been applied to a new developed immersion-compatible sol-gel layer.

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We developed specific negative tone resists suitable for preparing periodic inorganic nanostructures by ArF photolithography. This approach is based on the sol-gel chemistry of modified metal alkoxides followed by DUV laser irradiation. Patterning at the nanoscale was demonstrated by using an achromatic interferometer operating at 193 nm.

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