Self-assembly of colloidal particles for 'bottom-up' fabrication of various patterns and structures is critical for a range of applications including, but not limited to, energy generation and storage, nanomaterial structures, biomimetics, and biosensing. Multiple self-assembly techniques, such as substrate templating- topological or chemical patterning-and solvent evaporation were discussed in our previous papers and have been developed for the deposition of patterned self-assembled structures, such as bands of colloidal particles, on various substrates. While the templating techniques are limited in applications due to the requirements for pattern-specific prior substrate engineering to fabricate the desired structure, solvent evaporation requires longer assembly times and precise control over environmental conditions.
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